On March 5-6, 2025, the VUB MicroFlow Cell hosted the General Assembly of the HaloFreeEtch project.
In this EIC Pathfinder project, µFlow Cell cooperates with TU Chemnitz, PlasmaSolve, Fraunhofer ENAS, Uni Graz, LioniX International and Warrant Hub. It is part of the EIC portfolio of projects on ‘Responsible Electronics’.
HaloFreeEtch aims to replace fluor and other halogen compounds by halogen-free alternatives in plasma etching, one of the key manufacturing steps for semiconductors.
The activities of the MicroFlow Cell focus on plasma etching of glass, using the latest state-of-the-art equipment installed in the MICROLAB cleanroom.